Improvement in gate LWR with plasma curing of ArF photoresists

Atsushi Ando, Eriko Matsui, Nobuyuki Matsuzawa, Yohei Yamaguchi, K. Kugimiya, M. Yoshida, K. M. A. Salam, Taketoshi Kusakabe, Takahide Tatsumi

Thin Solid Films · 2006 · 10 citations · 2 references

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