Publication | Closed Access
Mechanism of fatigue in micron-scale films of polycrystalline silicon for microelectromechanical systems
100
Citations
13
References
2002
Year
EngineeringMechanical EngineeringMicroelectromechanical SystemsFatigueMicro-electromechanical SystemDirect ObservationMicrostructure-strength RelationshipMaterials ScienceMaterials EngineeringMechanical BehaviorSolid MechanicsPlasticityMicroelectronicsFatigue Damage AccumulationLow-cycle FatigueMicrostructureMicron-scale FilmsSilicon DebuggingDislocation InteractionMicrofabricationApplied PhysicsNano Electro Mechanical SystemPolycrystalline SiliconThin FilmsSilicon Thin FilmsMechanics Of Materials
Reported nearly a decade ago, cyclic fatigue failure in silicon thin films has remained a mystery. Silicon does not display the room-temperature plasticity or extrinsic toughening mechanisms necessary to cause fatigue in either ductile (e.g., metals) or brittle (e.g., ceramics and ordered intermetallics) materials. This letter presents experimental evidence for the cyclic fatigue of silicon via a conceptually different mechanism termed reaction-layer fatigue. Based on mechanical testing, electron microscopy, and self-assembled monolayers, we present direct observation of fatigue-crack initiation in polycrystalline silicon, the mechanism of crack initiation, and a method for altering fatigue damage accumulation.
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