Kinetic model of the chemical etching of Si(111) surfaces by buffered HF solutions - Concepedia

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Kinetic model of the chemical etching of Si(111) surfaces by buffered HF solutions

91

Citations

19

References

1992

Year

P. Jakob, Yves J. Chabal, Krishnan Raghavachari, R. S. Becker, A. J. Becker

Surface Science

Materials ScienceChemical EtchingSurface CharacterizationEngineeringPhysicsMicrofabricationSurface AnalysisSurface ScienceApplied PhysicsBuffered Hf SolutionsKinetic ModelSilicon On InsulatorMicroelectronicsPlasma Etching

References

	Year	Citations

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