Surface diffusion and layer morphology of ((112¯2)) GaN grown by metal-organic vapor phase epitaxy

Abstract

( 11 2 ¯ 2 ) GaN layers were grown by metal-organic vapor phase epitaxy on (112¯2) bulk GaN substrates and (101¯0) sapphire substrates. The growth temperature was varied between 950 and 1050 °C and the total reactor pressure between 50 and 600 mbar. The growth conditions show a strong impact on the yellow band luminescence properties, while weak impact on the threading dislocation density was observed. The layer morphologies exhibit undulations with two periods along GaN [11¯00] and one period along [112¯3¯]. The different period lengths are connected to anisotropic adatom surface diffusion lengths. Arrow like features on the surface originate from the interference of the undulations along [112¯3¯] and [11¯00].