Textured ZnO Thin Films for Solar Cells Grown by Metalorganic Chemical Vapor Deposition

Abstract

Textured ZnO films have been grown by metalorganic chemical vapor deposition (MOCVD) using diethylzinc (DEZ) and H 2 O as reactant gases. It was found that the surface morphology of films was strongly dependent on the substrate temperature. For the low substrate temperature of 150°C, the surface consists of uniformly sized tetrapodlike features. These undoped films have a high transparency in a wide wavelength range from 400 nm to 1400 nm. The low-resistivity ZnO films have also been succesfully grown using a dopant gas of B 2 H 6 diluted with H 2 . A sheet resistivity as low as 10 Ω/□ was obtained.