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<title>Trends in optical design of projection lenses for UV and EUV lithography</title>
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2000
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Optical DesignOptical MaterialsEngineeringElectron-beam LithographyEuv LithographyOptic DesignMicro-optical ComponentWafer Scale ProcessingBeam LithographyOptical PropertiesOptical System DesignPhotonic Integrated CircuitOptical SystemsPhotonicsElectrical EngineeringOphthalmologySia RoadmapDesignOptometryMicroelectronicsOptical ComponentsMicroelectronic CircuitsMicrofabricationApplied PhysicsGeometrical AberrationOptical SciencesTechnologyOptoelectronicsLens DesignProjection Lenses
The continuing trend towards higher integration density of microelectronic circuits requires steadily decreasing feature sizes. The SIA roadmap defines the technologies needed to meet this challenges. One of the fundamental requirements for lithography with a resolution of 100 nm and below is the development of new high-performance optical designs for projection lenses.