Publication | Closed Access
Nanoscale dry etching of germanium by using inductively coupled CF4 plasma
16
Citations
19
References
2012
Year
Materials ScienceEngineeringPhysicsMicrofabricationMaterials FabricationNanotechnologySurface ScienceApplied PhysicsNanoscale Dry EtchingCf4 PlasmaVacuum DevicePlasma ApplicationPlasma EtchingPlasma Processing
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