Publication | Closed Access
Precursor design and reaction mechanisms for the atomic layer deposition of metal films
114
Citations
139
References
2013
Year
Materials SciencePrecursor DesignEngineeringNanotechnologySurface ScienceApplied PhysicsMetal FilmsThin FilmsChemical DepositionChemical Vapor DepositionAtomic Layer DepositionThin Film Processing
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