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Effect of UV-Ozone Treatment on the Performance of ZnO TFTs Fabricated by RF Sputtering Deposition Technique
21
Citations
28
References
2014
Year
EngineeringZinc OxideOptoelectronic DevicesThin Film Process TechnologySemiconductor DeviceElectronic DevicesOptical PropertiesThin Film ProcessingMaterials EngineeringMaterials ScienceElectrical EngineeringOxide ElectronicsOxide SemiconductorsGallium OxideUv-ozone TreatmentOptimal Uv-ozone TreatmentZno TftsApplied PhysicsThin FilmsOptoelectronics
In this paper, bottom-gate thin-film transistors (TFTs) with zinc oxide (ZnO) channels were grown on Si substrates with an SiO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> dielectric layer via the radio-frequency sputtering technique. The ZnO films were then subjected to 16 min of ultraviolet (UV)-ozone treatment, which resulted in fewer oxygen vacancies, enhanced crystallization, lower strain, lower surface roughness, and higher thin-film density, as well as improved surface energy and adhesion properties of the gallium zinc oxide source/drain electrodes. The UV-ozone 16-min ZnO active layer TFT with the preferable resistivity values by Hall measurement results. The optimal UV-ozone treatment time (16 min) led to the smallest full-width at half-maximum (0.4138°), smallest strain (2.61 × 10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">-3</sup> ), highest thin-film density (5.78 g/cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sup> ), lowest surface roughness (1.75 nm), and largest surface energy (65.3 mJ/m <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> ). The saturation mobility, subthreshold voltage, ON/OFF current ratio, and trap density of the ZnO TFTs with optimal UV-ozone treatment were 4.54 cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> V <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">-1</sup> S <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">-1</sup> , 0.28 V/decade, 2.02 × 10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">7</sup> , and 2.61 × 10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">11</sup> eV <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">-1</sup> cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">-2</sup> , respectively, indicating the potential of this structure to be applied to large-area flat-panel displays.
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