Reflection high-energy electron diffraction intensity oscillations during the growth of Pb on Si(111)

Abstract

The growth of Pb on Si(111) at low temperatures is studied by reflection high-energy electron diffraction. Pronounced specular beam intensity oscillations are found which depend in detail upon the state of the surface, codeposition of trace amounts of other metals, residual gas pressure, and temperature. The consequences for the understanding of RHEED intensity oscillations and of the growth of ultrathin films are discussed.