Materials science communication formation of aln films by al evaporation with nitrogen ion beam bombardment

Use of ion beam assisted deposition to modify the microstructure and properties of thin films

F.A. Smidt · International Materials Reviews · 1990 · 411 citations

Natural Sciences, Materials Engineering, Materials Science +17

Principles of Electronic Packaging

D. P. Seraphim, Ronald C. Lasky, Che‐Yu Li et al. · Journal of Electronic Packaging · 1989 · 354 citations

Agriculture, Electrical Engineering, Materials Science +12

Effect of ion bombardment during deposition on the x-ray microstructure of thin silver films

T. C. Huang, G. Lim, F. Parmigiani et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1985 · 177 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +17

Growth of aluminum nitride thin films on Si(111) and Si(001): Structural characteristics and development of intrinsic stresses

W. J. Meng, Jeffrey A. Sell, Thomas A. Perry et al. · Journal of Applied Physics · 1994 · 97 citations

Natural Sciences, Materials Engineering, Materials Science +17

Formation of Al-nitride films at room temperature by nitrogen ion implantation into aluminum

N. Lieske, Rudolf Hezel · Journal of Applied Physics · 1981 · 79 citations

Natural Sciences, Materials Engineering, Materials Science +17