Publication | Open Access
Transparent hybrid polymer stamp copies with sub-50-nm resolution for thermal and UV-nanoimprint lithography
37
Citations
5
References
2009
Year
EngineeringElectron-beam LithographyMechanical EngineeringPolymer NanocompositesImprint TemperatureBeam LithographyMaterials FabricationPolymer ProcessingPrinted ElectronicsUv-nanoimprint LithographyNanolithographyPhotopolymer NetworkSub-50-nm ResolutionElectronic PackagingPolymer ChemistryNanolithography MethodMaterials ScienceNanomanufacturingFabrication TechniqueMolecular Imprinting3D PrintingFlexible ElectronicsMicrofabricationCured Hybrid StampPolymer ScienceApplied PhysicsPolymer CharacterizationNanofabricationStructural Fidelity
The organic-inorganic hybrid polymer Ormostamp was successfully used for the fabrication of inexpensive, transparent working stamps to be used in nanoimprint lithography. The stamps were produced from different masters by casting and UV exposure of a viscous precursor. The cured hybrid stamp with the replicated surface relief was imprinted into several thermoplastic materials with up to 180 °C imprint temperature. In this article the authors show the effect of the imprint temperature on the structural fidelity. By using combined thermal and UV-nanoimprint lithography at 110 °C imprint temperature, a resolution down to 35 nm is demonstrated. They also investigated deterioration effects due to plasma treatment to simulate the effect of multiple recoating steps.
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