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Alternative Photoresist Removal Process to Minimize Damage of Low-k Material Induced by Ash Plasma

DOI

16

Citations

10

References

2008

Year

Quoc Toan Le, Johan Keldermans, Nicolò Chiodarelli, Els Kesters, Marcel Lux, Martine Claes, Guy Vereecke
Japanese Journal of Applied Physics

Abstract

Alternative Photoresist Removal Process to Minimize Damage of Low-k Material Induced by Ash Plasma, Le, Quoc Toan, Keldermans, Johan, Chiodarelli, Nicoló, Kesters, Els, Lux, Marcel, Claes, Martine, Vereecke, Guy

References

YearCitations

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