Matching the Resolution of Electron Beam Lithography by Scanning Near-Field Photolithography

Abstract

Molecular features with widths of only 20 nm have been fabricated in self-assembled monolayers of alkanethiols on gold using a new lithographic tool, scanning near-field photolithography, based upon the use of a near-field scanning optical microscope (NSOM) coupled to a UV laser. Quite unexpectedly it has proved possible to routinely fabricate structures significantly smaller than the aperture in the NSOM probe. This exceptional performance is strongly correlated with the morphology of the gold film. In particular, the best results are achieved on films with comparatively small grain sizes. In contrast, the use of atomically flat, epitaxially deposited gold films leads to a minimum feature size comparable to the aperture diameter (ca 50 nm). It is concluded that nonradiative interactions (possibly the excitation of surface plasmons) between the gold substrate and the fiber lead to a pronounced focusing of the electric field beneath the aperture.