Focused Electron Beam‐Induced CVD of Iron: a Practical Guide for Direct Writing

Abstract

Magnetic materials synthesized on the nanometer‐scale level are essential for several applications, such as spintronics and magnetologic. As a successful nanofabrication approach, focused electron beam‐induced deposition (FEBID) stands out as a direct‐write technique. FEBID uses an electron beam to locally induce a CVD process, avoiding the use of masks and resists. In this work, Fe–based nanostructures are synthesized on Si(100) by FEBID, starting from iron pentacarbonyl. A systematic variation of FEBID parameters is performed, to study their influence on the geometry and composition of the deposit. Based on the results, specific deposition conditions are suggested for magneto‐logic applications and fabrication of large structures.