Carrier-gas effects on characteristics of copper chemical vapor deposition using hexafluoro-acetylacetonate-copper (1) trimethylvinylsilane - Concepedia

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Carrier-gas effects on characteristics of copper chemical vapor deposition using hexafluoro-acetylacetonate-copper (1) trimethylvinylsilane

40

Citations

14

References

1995

Year

Nobuyoshi Awaya, Yoshinobu Arita

Thin Solid Films

Materials ScienceChemical EngineeringEngineeringCarrier-gas EffectsChemistryChemical DepositionChemical Vapor Deposition

References

	Year	Citations

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