Nobuyoshi Awaya - Concepedia

Author

Nobuyoshi Awaya

NTT Basic Research Laboratories

Also Known As

Awaya, Nobuyoshi, N. Awaya, Nobuyoshi Awaya

Publications

815

Citations

H-Index

Concepts

All Affiliations

NTT Basic Research Laboratories Shizuoka University Taiyo Yuden (Japan)

About

Nobuyoshi Awaya is an author at NTT Basic Research Laboratories specializing in engineering, applied physics, and microelectronics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	11	13	753
2	Applied Physics	10	10	632
3	Chemical Engineering	4	4	309
4	Computer Engineering	3	3	264
5	Chemistry	2	2	80

Nobuyoshi Awaya

Publications

778

Citations

H-Index

Page 1

	Year	Citations
Ti O 2 anatase nanolayer on TiN thin film exhibiting high-speed bipolar resistive switching Masayuki Fujimoto, Hiroshi Koyama, Masashi Konagai, Applied Physics Letters EngineeringTio2 Anatase LayerBinary Transition MetalPhase Change MemoryChemical Engineering	2006	218
Novel colossal magnetoresistive thin film nonvolatile resistance random access memory (RRAM) W.W. Zhuang, Wei Pan, Bruce Ulrich, MagnetismElectrical EngineeringNon-volatile MemoryEngineeringResistance Ram	2003	155
High Speed Unipolar Switching Resistance RAM (RRAM) Technology Yasunari Hosoi, Yasunari Tamai, Tsuyoshi Ohnishi, Non-volatile MemoryElectrical EngineeringEngineeringApplied PhysicsComputer Engineering	2006	66
Evaluation of a copper metallization process and the electrical characteristics of copper-interconnected quarter-micron CMOS Nobuyoshi Awaya, Hiroshi Inokawa, Ei YAMAMOTO, IEEE Transactions on Electron Devices EngineeringSilicon On InsulatorInterconnect (Integrated Circuits)Electrical CharacteristicsWafer Scale Processing	1996	52
Resistance random access memory switching mechanism Sheng Teng Hsu, Tingkai Li, Nobuyoshi Awaya Journal of Applied Physics Hardware SecurityNon-volatile MemoryElectrical EngineeringEngineeringPhysics	2007	43
Double-level copper interconnections using selective copper CVD Nobuyoshi Awaya, Yoshinobu Arita Journal of Electronic Materials 3D Ic ArchitectureElectrical EngineeringEngineeringAdvanced Packaging (Semiconductors)Nanoelectronics	1992	41
The Effect of Adding Hexafluoroacetylacetone on Chemical Vapor Deposition of Copper Using Cu(I) and Cu(II) Precursor Systems Nobuyoshi Awaya, Kazuhide Ohno, Yoshinobu Arita Journal of The Electrochemical Society Materials ScienceMaterials EngineeringChemical EngineeringCopper Oxide MaterialsCopper Using Cu	1995	40
Carrier-gas effects on characteristics of copper chemical vapor deposition using hexafluoro-acetylacetonate-copper (1) trimethylvinylsilane Nobuyoshi Awaya, Yoshinobu Arita Thin Solid Films Materials ScienceChemical EngineeringEngineeringCarrier-gas EffectsChemistry	1995	40
Copper Metallization Technology for Deep Submicron ULSIs Yoshinobu Arita, Nobuyoshi Awaya, K. Ohno, MRS Bulletin Materials ScienceMaterials EngineeringEngineeringMetallurgical SystemCorrosion	1994	31
Resistivity and resistive switching properties of Pr0.7Ca0.3MnO3 thin films Masayuki Fujimoto, Hiroshi Koyama, Shinji Kobayashi, Applied Physics Letters Materials ScienceMaterials EngineeringElectrical EngineeringMaterial AnalysisEngineering	2006	25

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