Applied Physics Express · 2009 · 258 citations · 7 references
EngineeringMaterials EngineeringMaterials ScienceOptoelectronicsSemiconductor DevicesSemiconductor MaterialsChemical Vapor DepositionLaser DiodesOptoelectronic DevicesSemiconductor Device MaterialsSemiconductor LasersWide-bandgap Semiconductor DevicesEpitaxial MaterialsGallium Nitride (Gan) MaterialsGallium Nitride Crystal GrowthGreen Laser DiodesMetal-organic Chemical Vapor DepositionPower OutputSemiconductor Laser DiodesThreshold Voltage
We succeeded in developing InGaN-based green laser diodes (LDs) with a wavelength of 515 nm under continuous-wave (cw) operation by improving the growth condition of epitaxial layers and structures of LDs. The LD structures were grown on conventional c-plane free-standing GaN substrates by metal organic chemical vapor deposition (MOCVD). The threshold current and threshold voltage at 515 nm were 53 mA and 5.2 V, respectively. The lifetime of 510–513 nm LDs was estimated to be over 5000 h under cw operation with an optical output power of 5 mW at 25 °C.
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500 nm electrically driven InGaN based laser diodes
Desirée Queren, Adrian Avramescu, G. Brüderl et al. · Applied Physics Letters · 2009 · 149 citations
Low-threshold buried-ridge II-VI laser diodes
M. A. Haase, P. F. Baude, M. S. Hagedorn et al. · Applied Physics Letters · 1993 · 84 citations