ACS Applied Materials & Interfaces · 2015 · 76 citations · 57 references
Natural SciencesMaterials EngineeringMaterials ScienceMaterials ChemistrySemiconductor MaterialsThin FilmsEtching ProcessesPolymer Thin FilmsSilicon MaterialsThin Film EtchingThin-film MaterialsThin-film PatterningBlock Copolymer Self-assemblyBlock Copolymer Thin FilmsDensityHydrogen Silsesquioxane ProcessingPolymer Self-assemblySelf-assembled Thin FilmsSelf-assembling PolymersSilicon Thin Films
The directed self-assembly (DSA) of lamella-forming poly(styrene-block-trimethylsilylstyrene) (PS-PTMSS, L0=22 nm) was achieved using a combination of tailored top interfaces and lithographically defined patterned substrates. Chemo- and grapho-epitaxy, using hydrogen silsesquioxane (HSQ) based prepatterns, achieved density multiplications up to 6× and trench space subdivisions up to 7×, respectively. These results establish the compatibility of DSA techniques with a high etch contrast, Si-containing BCP that requires a top coat neutral layer to enable orientation.
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