Evidence for surface asperity mechanism of conductivity in oxide grown on polycrystalline silicon

Abstract

High conductivity observed in oxides grown on polycrystalline silicon has been previously speculated as being due to asperities on the silicon surface, which enhance the oxide field. Direct evidence of these asperities is shown here in SEM micrographs. The presence of the asperities is strongly correlated with the oxide conductivity (as controlled by the oxidation temperature).