Micro‐Nanostructured Interfaces Fabricated by the Use of Inorganic Block Copolymer Micellar Monolayers as Negative Resist for Electron‐Beam Lithography

Abstract

Abstract This paper introduces an approach where the match of two different length scales, i.e., pattern from self‐assembly of block copolymer micelles (< 100 nm) and electron‐beam (e‐beam) writing (> 50 nm), allow the grouping of nanometer‐sized gold clusters in very small numbers in even aperiodic pattern and separation of these groups at length scales that are not accessible by pure self‐assembly. Thus, we could demonstrate the grouping of Au nanoclusters in different geometries such as squares, rings, or spheres.