Concepedia

Conformal ion implantation using pulsed plasma sources

R. J. Adler, R.J. Richter-Sand, E. J. Clark, C. W. Gregg

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 19 citations · 8 references

DOI

Concepts

Abstract

Operation of plasma implantation equipment at currents of several hundred amperes has been achieved with high density (1011–1012/cc) pulsed plasma sources. These currents have lead to inferred sheath dimensions in the 1–2 cm range. The equipment, results, and analysis are described here in detail.

References

8

Model of plasma source ion implantation in planar, cylindrical, and spherical geometries

J.T. Scheuer, M. Shamim, J. R. Conrad · Journal of Applied Physics · 1990 · 172 citations

, , +17

Ion implantation in tribology and corrosion science

J. K. Hirvonen · Journal of Vacuum Science and Technology · 1978 · 122 citations

, , +14

Measurements of spatial and temporal sheath evolution for spherical and cylindrical geometries in plasma source ion implantation

M. Shamim, J.T. Scheuer, J. R. Conrad · Journal of Applied Physics · 1991 · 112 citations

, , +14

Plasma source ion implantation: A new approach to ion beam modification of materials

J. R. Conrad · Materials Science and Engineering A · 1989 · 82 citations

, , +11

Comparison between conventional and plasma source ion-implanted femoral knee components

A. Chen, J.T. Scheuer, C. Ritter et al. · Journal of Applied Physics · 1991 · 55 citations

, , +8