Modelling of wafer heating during rapid thermal processing

Rapid isothermal processing

Rajendra Singh · Journal of Applied Physics · 1988 · 285 citations

Engineering, Thermal Processing, Integrated Circuits +18

Radiation Annealing of Boron-Implanted Silicon with a Halogen Lamp

Kazuo Nishiyama, Michio Arai, N. Watanabe · Japanese Journal of Applied Physics · 1980 · 117 citations

Implanted Boron, Electrical Engineering, Ion Implantation +10

Defects introduced in silicon wafers during rapid isothermal annealing: Thermoelastic and thermoplastic effects

G. G. Bentini, L. Correrá, C. Donolato · Journal of Applied Physics · 1984 · 113 citations

Engineering, Silicon On Insulator, Defect Tolerance +21

Rapid thermal processing of electronic materials

S. R. Wilson, R. A. Powell, Donna E. Davies · OSTI OAI (U.S. Department of Energy Office of Scientific and Technical Information) · 1987 · 42 citations

Engineering, Silicon On Insulator, Semiconductor Device +16

Crystallographic slip in GaAs wafers annealed using incoherent radiation

R.T. Blunt, M. S. M. Lamb, Roy Szweda · Applied Physics Letters · 1985 · 38 citations

Epitaxial Growth, Engineering, Physics +12