Strain accommodation in mismatched layers by molecular beam epitaxy: Introduction of a new compliant substrate technology - Concepedia

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Strain accommodation in mismatched layers by molecular beam epitaxy: Introduction of a new compliant substrate technology

25

Citations

11

References

1996

Year

C. Carter-Coman, April S. Brown, N.M. Jokerst, Douglas Dawson, R. N. Bicknell-Tassius, Z. C. Feng, K. C. Rajkumar, G. Dagnall

Journal of Electronic Materials

Materials ScienceMaterials EngineeringEngineeringElectron-beam LithographyBeam LithographyMicrofabricationMismatched LayersSurface ScienceApplied PhysicsStrain AccommodationElectronic PackagingMolecular Beam EpitaxyEpitaxial GrowthNanolithography Method

References

	Year	Citations

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