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Behavior of Ar plasmas formed in a mirror field electron cyclotron resonance microwave ion source
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1990
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EngineeringPlasma SciencePlasma PhysicsPlasma ElectronicsLaser Plasma PhysicsPlasma TheoryPlasma ConfinementPlasma PhotonicsMaterials SciencePhysicsApplied Plasma PhysicAtomic PhysicsNuclear AstrophysicsIon SourceNatural SciencesApplied PhysicsAr PlasmasVacuum SciencePlasma Application
Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation S. M. Gorbatkin, L. A. Berry, J. B. Roberto; Behavior of Ar plasmas formed in a mirror field electron cyclotron resonance microwave ion source. Journal of Vacuum Science & Technology A 1 May 1990; 8 (3): 2893–2899. https://doi.org/10.1116/1.576645 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAVS: Science & Technology of Materials Interfaces and ProcessingJournal of Vacuum Science & Technology A Search Advanced Search |Citation Search