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Strain relaxation and induced defects in InAsSb self-assembled quantum dots
19
Citations
15
References
2006
Year
Materials ScienceSemiconductorsIi-vi SemiconductorEngineeringPhysicsNanotechnologyNanoelectronicsStrain RelaxationApplied PhysicsQuantum MaterialsQuantum DotsCondensed Matter PhysicsDefect FormationInduced DefectsMicroelectronicsCompound SemiconductorInas0.94sb0.06 Quantum DotsSemiconductor Nanostructures
The onset of strain relaxation and induced defects in InAs0.94Sb0.06 quantum dots are investigated. We show that the relaxation causes partial carrier depletion in the dots and drastic carrier depletion in the top GaAs layer due to the introduction of two defect traps at 0.35 and 0.64eV. This result is consistent with transmission electron microscopy data which show misfit dislocations on the edges of the dot upper boundary and threading dislocations in the top GaAs layer. The bottom GaAs layer is dislocation-free, and thus the strain relaxation may initially occur on the edges of the dots.
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