Step-flow mechanism versus pit corrosion: scanning-tunneling microscopy observations on wet etching of Si(111) by HF solutions

The Evolution of Silicon Wafer Cleaning Technology

Werner Kern · Journal of The Electrochemical Society · 1990 · 1.7K citations

Engineering, Electrical Engineering, Materials Science +17

Ideal hydrogen termination of the Si (111) surface

G. S. Higashi, Yves J. Chabal, Gary W. Trucks et al. · Applied Physics Letters · 1990 · 1.4K citations

Natural Sciences, Chemistry, Materials Science +17

Comparison of Si(111) surfaces prepared using aqueous solutions of NH4F versus HF

G. S. Higashi, R. S. Becker, Yves J. Chabal et al. · Applied Physics Letters · 1991 · 488 citations

Natural Sciences, Chemistry, Materials Science +17

The impact of semiconductors on the concepts of electrochemistry

H. Gerischer · Electrochimica Acta · 1990 · 470 citations

Natural Sciences, Chemistry, Materials Science +10

Atomic-scale conversion of clean Si(111):H-1×1 to Si(111)-2×1 by electron-stimulated desorption

R. S. Becker, G. S. Higashi, Yves J. Chabal et al. · Physical Review Letters · 1990 · 355 citations

Natural Sciences, Materials Science, Physics +17