From Mesoscopic to Nanoscopic Surface Structures: Lithography with Colloid Monolayers

Abstract

Colloid monolayer lithography is briefly reviewed and demonstrated to be a powerful alternative technique for the nanostructuring of surfaces. The Figure shows a colloid monolayer viewed through a TEM grid used to transport the monolayer to the desired substrate. The monolayer and grid together form a lithographic mask that can later be removed to leave, for example, a pattern of deposited gold dots.