Journal of Applied Physics · 1975 · 23 citations · 5 references
Natural SciencesMaterials SciencePhysicsCondensed Matter PhysicsElectronic MaterialsThin FilmsCoatingsSurface PhysicsThin Film Electrical PropertiesThin Film NucleationThin-film DepositionThin-film MaterialsCrystallization In Thin FilmsCrystallographic Preferred OrientationDeposition RateDeposition Rate EffectsDeposition Rate OptimizationFilm ThicknessHall EffectPreferred Orientation
The effect of Au nucleation sites, deposition rates, and the film thickness on the crystallinity and electronic properties of evaporated Te films has been investigated. It has been found that to obtain large−grain Te films there exists an optimum conditoin in the coating ratio of Au nucleation sites and the film thickness of Te, and that a fast deposition rate of Te results generally in large−grain Te films with preferred orientation. The best films obtained have shown a grain size of 20−30 μ diameter with the c axis parallel to the substrate and a Hall mobility of 170 cm2 V−1 sec−1.
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Electrical properties of tellurium thin films
R.W. Dutton, R.S. Muller · Proceedings of the IEEE · 1971 · 58 citations
Structure and growth of oriented tellurium thin films
E.J. Weidmann, J.C. Anderson · Thin Solid Films · 1971 · 56 citations
Large grain tellurium thin films
R.W. Dutton, R.S. Muller · Thin Solid Films · 1972 · 31 citations
Natural Sciences, Materials Engineering, Materials Science +12