Journal of Applied Physics · 1979 · 44 citations · 16 references
EngineeringMaterials SciencePhysicsElectronic MaterialsSemiconductor DevicesSemiconductor MaterialsSemiconductor Device MaterialsSemiconductor HeterostructuresSemiconductor InterfacesSemiconductor PhysicsSemiconductor SurfacesSemiconductor Thin FilmsEffective MassElectron DensityElectron Density DistributionsElectron Density ProfilesElectronic Density Of StatesGallium ArsenideGallium Arsenide Field-effect TransistorsIndium Gallium Arsenide
The electron density and mobility of VPE-grown 15-μm n-type indium arsenide epilayers have been determined as a function of distance from the gallium arsenide substrate. Both epilayer surfaces show significant increases in density and decreases in mobility from the bulk values (1015–1016 cm−3 and 105 cm2/V sec at 77 °K). The interfacial, or back, surface is apparently dominated by defects to a depth of about 3 μm. The density and mobility profiles are roughly exponential; integrated values are 1.6×1013 cm−2 and 2×103 cm2/V sec. The front surface, highly dependent on applied gate bias, has a density range in accumulation from zero to 5×1012 cm−2 and mobility from 2.5×104 to 3×103 cm2/V sec. The parameters for both surfaces are essentially temperature independent below 80 °K. The front-surface effective mass increases with electron density from its band-edge value of 0.0215me to nearly 0.06 me.
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Band structure of indium antimonide
E. O. Kane · Journal of Physics and Chemistry of Solids · 1957 · 3.7K citations
Fermi Level Position at Metal-Semiconductor Interfaces
Carver Mead, W. G. Spitzer · Physical Review · 1964 · 477 citations
Transport coefficients of InAs epilayers
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Preparation and properties of epitaxial InAs
John P. McCarthy · Solid-State Electronics · 1967 · 35 citations