The role of dissolved oxygen in hot water during dissolving oxides and terminating silicon surfaces with hydrogen

Ideal hydrogen termination of the Si (111) surface

G. S. Higashi, Yves J. Chabal, Gary W. Trucks et al. · Applied Physics Letters · 1990 · 1.4K citations

Natural Sciences, Chemistry, Materials Science +17

Infrared spectroscopy of Si(111) and Si(100) surfaces after HF treatment: Hydrogen termination and surface morphology

Yves J. Chabal, G. S. Higashi, K. Raghavachari et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1989 · 664 citations

Natural Sciences, Chemistry, Materials Science +17

The formation of hydrogen passivated silicon single-crystal surfaces using ultraviolet cleaning and HF etching

Takayuki Takahagi, Ichiro Nagai, A. Ishitani et al. · Journal of Applied Physics · 1988 · 495 citations

Engineering, Materials Engineering, Materials Science +17

Infrared spectroscopy of Si(111) surfaces after HF treatment: Hydrogen termination and surface morphology

V. A. Burrows, Yves J. Chabal, G. S. Higashi et al. · Applied Physics Letters · 1988 · 459 citations · Full text

Natural Sciences, Materials Science, Physics +14

Investigations on hydrophilic and hydrophobic silicon (100) wafer surfaces by X-ray photoelectron and high-resolution electron energy loss-spectroscopy

M. Grundner, H.‐E. Jacob · Applied Physics A · 1986 · 411 citations

Natural Sciences, Materials Engineering, Materials Science +17