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Transparent Conducting Cadmium‐Tin Oxide Films Deposited by RF Sputtering from a CdO ‐ SnO2 Target
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1980
Year
Materials ScienceSemiconductorsSintered TargetOptical MaterialsOxygen ConcentrationEngineeringNanomaterialsOxide ElectronicsOxide SemiconductorsApplied PhysicsSurface ScienceSemiconductor MaterialThin Film Process TechnologyCadmium‐tin OxideThin FilmsChemical DepositionChemical Vapor DepositionThin Film Processing
Transparent conducting films of cadmium‐tin oxide (CTO) were prepared by rf sputtering from a sintered target in an Ar or an atmosphere. The electrical and optical properties of the films were found to depend upon the oxygen concentration in the gas mixture. The films with the lowest resistivity of and high optical transmission of 85% over the visible region were obtained without post‐heat‐treatment.