Design and fabrication of SiO/sub 2//Si/sub 3/N/sub 4/ integrated-optics waveguides on silicon substrates

Abstract

In this paper, the design and fabrication of silicon-based optical waveguides are revisited. The goal is to develop a novel design and deposition process to minimize leakage losses. Interface roughness and Si/sub 3/N/sub 4/ stoichiometry are examined. The optical loss is measured and contributions from scattering and absorption are determined.