Function of Substrate Bias Potential for Formation of Cubic Boron Nitride Films in Plasma CVD Technique

Abstract

Cubic BN thin films are formed in RF discharge in B 2 H 6 and N 2 at low pressures under a magnetic field to confine the plasma, for negatively self-biased substrate electrodes. Ion bombardment on the growing surface is suggested to play an important role in the formation of cubic BN. The deposited films are characterized by infrared absorption spectroscopy and transmission electron microscopy which show that they are composed of microcrystals of cubic BN with 100-200 Å grain size.