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Low Specific Contact Resistivity to n-Ge and Well-Behaved Ge ${\rm n}^{+}/{\rm p}$ Diode Achieved by Multiple Implantation and Multiple Annealing Technique
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Citations
16
References
2013
Year
EngineeringSemiconductor DeviceMultiple AnnealingMaterials ScienceMaterials EngineeringElectrical EngineeringSemiconductor TechnologySemiconductor MaterialSemiconductor Device Fabrication\Rm PMicroelectronicsElectrical PropertySpecific Contact ResistivityMultiple ImplantationMaterial AnalysisSpecific ResistanceSurface ScienceApplied PhysicsMultiple Annealing TechniqueMaterial Performance
In this letter, the specific contact resistivity of metal on n-doped germanium is significantly reduced to <formula formulatype="inline" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex Notation="TeX">$3.8\times 10^{-7}~\Omega\cdot {\rm cm}^{2}$</tex></formula> by <formula formulatype="inline" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex Notation="TeX">${\rm P}^{+}$</tex></formula> multiple implantation and multiple annealing (MIMA) technique. The dramatic reduction of specific contact resistivity is attributed to the enhanced activation of n-type dopants, and a high electrical activation over <formula formulatype="inline" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex Notation="TeX">$1\times 10^{20}~{\rm cm}^{-3}$</tex></formula> is demonstrated by the spreading resistance profiling analysis. In addition, the fabricated germanium <formula formulatype="inline" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex Notation="TeX">${\rm n}^{+}/{\rm p}$</tex></formula> diode by <formula formulatype="inline" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex Notation="TeX">${\rm P}^{+}$</tex></formula> MIMA technique exhibits an <formula formulatype="inline" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex Notation="TeX">$I_{\rm ON}/I_{\rm OFF}$</tex></formula> ratio over <formula formulatype="inline" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex Notation="TeX">$10^{5}$</tex></formula> with low ideality factor of 1.11. The low specific contact resistivity of metal on n-doped germanium and well-behaved germanium <formula formulatype="inline" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex Notation="TeX">${\rm n}^{+}/{\rm p}$</tex></formula> diode are beneficial for the performance improvement of Ge nMOSFETs.
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