Properties of Ta–Ge–(O)N as a diffusion barrier for Cu on Si

Abstract

The properties of Ta–Ge–(O)N as a diffusion barrier for Cu on silicon have been investigated. Ta–Ge–(O)N was deposited on single crystal p-Si(001) by reactive sputtering. This was followed by in situ deposition of Cu. Diffusion barrier tests were conducted by subsequent annealing of individual samples in Ar atmosphere at higher temperature. The films were characterized by x-ray diffraction, Auger electron spectroscopy, and four-point probe. The results indicate that Ta–Ge–(O)N fails after annealing at 500°C for 1h compared to Ta(O)N which fails after annealing at 400°C for 1h indicating better diffusion barrier properties.