Hiral M. Ajmera

Tungsten Allylimido Complexes Cl₄(RCN)W(NC₃H₅) as Single-Source CVD Precursors for WN<i>_x</i>C<i>_y</i> Thin Films. Correlation of Precursor Fragmentation to Film Properties

Omar J. Bchir, Kelly M. Green, Hiral M. Ajmera et al. · Journal of the American Chemical Society · 2005 · 60 citations

Natural Sciences, Materials Engineering, Materials Science +16

Properties of Ta–Ge–(O)N as a diffusion barrier for Cu on Si

S. Rawal, D. P. Norton, Hiral M. Ajmera et al. · Applied Physics Letters · 2007 · 27 citations

Engineering, Materials Engineering, Materials Science +17

Deposition of WNxCy thin films for diffusion barrier application using the dimethylhydrazido (2−) tungsten complex (CH3CN)Cl4W(NNMe2)

Hiral M. Ajmera, Timothy J. Anderson, Jürgen Koller et al. · Thin Solid Films · 2009 · 22 citations

Natural Sciences, Materials Engineering, Materials Science +11

Synthesis and Characterization of Diorganohydrazido(2–) Tungsten Complexes

Jürgen Koller, Hiral M. Ajmera, Khalil A. Abboud et al. · Inorganic Chemistry · 2007 · 19 citations

Natural Sciences, Chemistry, Materials Science +16

Deposition of WN[sub x]C[sub y] Using the Allylimido Complexes Cl[sub 4](RCN)W(NC[sub 3]H[sub 5]): Effect of NH[sub 3] on Film Properties

Hiral M. Ajmera, Andrew T. Heitsch, Omar J. Bchir et al. · Journal of The Electrochemical Society · 2008 · 16 citations

Natural Sciences, Materials Engineering, Materials Science +17