Journal of Applied Physics · 1980 · 62 citations · 3 references
Natural SciencesMaterials EngineeringMaterials ScienceElectrochemistryMaterials ChemistryThin FilmsAmorphous MaterialsElectrochromic MaterialsElectrode-electrolyte InterfacesElectrolyte MaterialsOxide SemiconductorsThin Film Electrical PropertiesAmorphous OxidesAmorphous Thin FilmsDiffusion In Amorphous FilmsDiffusion In Oxide Thin FilmsDiffusion In OxidesElectron DiffusionMolybdenum Oxide ElectrochromicsOptical Properties Of Amorphous Materials
Coloration by electron diffusion and electrochromism was studied in HxMoO3 amorphous films following the technique of Crandall and Faughnan et al. in HxWO3. The measured diffusion coefficient for electrons was D=7.5×10−4 cm2/sec and the emf of the cell Cu-In-glycerol +H2SO4-HxMoO3-SnO2-Cu was measured as a function of x. The dynamics of the coloration process induced by small changes of the potential across the HxMoO3-electrolyte interface was studied by a photometric method.
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Richard S. Crandall, Peter J. Wojtowicz, Brian W. Faughnan · Solid State Communications · 1976 · 113 citations
Natural Sciences, Materials Engineering, Materials Science +13