Publication | Closed Access

Amorphous silicon carbide thin films (a-SiC:H) deposited by plasma-enhanced chemical vapor deposition as protective coatings for harsh environment applications

Materials EngineeringMaterials ScienceHarsh Environment ApplicationsEngineeringSurface ScienceApplied PhysicsChemical Vapor DepositionProtective CoatingsThin FilmsPlasma ProcessingThin Film ProcessingCarbide