Importance of ion beam parameters on self-organized pattern formation on semiconductor surfaces by ion beam erosion - Concepedia

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Importance of ion beam parameters on self-organized pattern formation on semiconductor surfaces by ion beam erosion

46

Citations

19

References

2004

Year

B. Ziberi, Frank Frost, M. Tartz, H. Neumann, B. Rauschenbach

Thin Solid Films

Ion ImplantationEngineeringPhysicsSurface ScienceApplied PhysicsIon Beam ErosionIon BeamIon EmissionSelf-organized Pattern FormationMicroelectronicsPlasma EtchingIon Beam Parameters

References

	Year	Citations

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