Japanese Journal of Applied Physics · 2002 · 151 citations · 4 references
Natural SciencesMaterials EngineeringMaterials ScienceMaterials CharacterizationOptical MaterialsThin FilmsOxide SemiconductorsSemiconductor Thin FilmsThin Film Electrical PropertiesThin Film Optical PropertiesThin Film StrainThin-film MaterialsCrystalline StructureFilm ThicknessOptical PropertiesPulsed Laser DepositionSurface Optical PropertiesThin Oxide FilmsThin Oxide LayersX-ray Diffraction Analysis
A series of ZnO films with various thicknesses were prepared on (0001) sapphire substrate by pulsed laser deposition (PLD). Scanning electron microscopy (SEM) and x-ray diffraction (XRD) analysis were utilized to investigate the effects of thickness variation on the surface morphology and the crystallinity. The electrical and optical properties of the films were also investigated as a function of the film thickness. It was found that the crystalline quality, electrical and optical properties of the films depended on the film thickness and were improved with increasing the film thickness. This is attributed to the fact that the films thinner than 4000 Å are under the severe misfit strain, which decreases with increasing the film thickness further.
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Optical Processes in Semiconductors
J. I. Pánkové, D. A. Kiewit · Journal of The Electrochemical Society · 1972 · 4.6K citations
Optically pumped lasing of ZnO at room temperature
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