Publication | Closed Access
High etch selectivity for plasma etching SiO2 with AlN and Al2O3 masks
29
Citations
5
References
2008
Year
Materials EngineeringMaterials ScienceEngineeringSurface ScienceApplied PhysicsHigh Etch SelectivityVacuum DeviceAl2o3 MasksMicroelectronicsPlasma EtchingOptoelectronicsPlasma Processing
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