Concepedia

Glancing-angle X-ray diffraction and X-ray photoelectron spectroscopy studies of nitrogen-implanted tantalum

P.M Raole, A.M. Narsale, D.C. Kothari, P. S. Pawar, S.V. Gogawale, L. Guzmàn, Maurizio Dapor

Materials Science and Engineering A · 1989 · 17 citations · 12 references

DOI

Concepts

References

12

Structure of Tantalum Nitrides

Nobuzo Terao · Japanese Journal of Applied Physics · 1971 · 175 citations

, , +12

Formation of chemical compounds by ion bombardment of thin transition metal films

I. M. Belii, V. S. Tishkov, V. M. Yankovskii · physica status solidi (a) · 1978 · 71 citations

, , +14

The surface binding energy in slow collisional sputtering

Roger Kelly · Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms · 1986 · 70 citations

, , +10

Properties of direct current magnetron reactively sputtered TaN

Bhola N. Mehrotra, Jim Stimmell · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1987 · 51 citations

, , +17

Effect of nitrogen on the electrical and structural properties of triode-sputtered tantalum films

David J. Willmott · Journal of Applied Physics · 1972 · 44 citations

, , +16