Mass spectrometer controlled electron beam evaporation synthesis of multilayered materials

Abstract

A UHV apparatus equipped with two high-power electron guns is extended with a multichannel quadrupole mass spectrometer which accurately controls the deposition rate. A rotating substrate holder is used for deposition of multilayers at room temperature; a fixed substrate holder enables one to prepare layered structures at liquid N2 temperature. A home-built load lock in combination with an extended travel sample manipulator permits a rapid change of the samples without breaking vacuum. The system has been used to deposit Nb/Cu and Pb/Ge multilayers and preliminary structural measurements indicate the samples are of high quality.