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Basal Plane Stacking-Fault Related Anisotropy in X-ray Rocking Curve Widths of m-Plane GaN
104
Citations
17
References
2008
Year
Wide-bandgap SemiconductorSemiconductor TechnologyElectrical EngineeringEngineeringCrystalline DefectsPhysicsApplied PhysicsCondensed Matter PhysicsAluminum Gallium NitrideGan Power DeviceDefect FormationM-plane Gan FilmsCoherent ScatteringCategoryiii-v SemiconductorM-plane GanBasal Plane
A model of basal plane stacking faults as boundaries between incoherently scattering domains in m-plane GaN films is reviewed. m-Plane GaN films are analyzed with a modified version of the Williamson–Hall analysis in order to determine the length-scale of coherent scattering and tilt-mosaic contribution to X-ray rocking curve widths for the primary in-plane directions. This analysis shows that basal plane stacking faults are the predominant source of rocking-curve width anisotropy in the m-plane films, and indicate that the modified Williamson–Hall analysis can be used as a non-destructive technique for measuring basal plane stacking fault densities in m-GaN films.
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