Journal of Applied Physics · 1992 · 64 citations · 7 references
Natural SciencesMaterials EngineeringMaterials ScienceElectronic MaterialsMaterials PhysicsSemiconductor MaterialsAlloysDopingElectronic Transport ModelingRare-earth-doped MaterialsAluminum-containing AlloysHole TransportImpurity ScatteringScattering
The hole mobility of Be-doped ( ∼ 2 × 1017 cm−3) AlxGa1−xAs, for x=0–1, is analyzed both theoretically and experimentally. Alloy scattering is very important, and in fact reduces the hole mobility from 150 to less than 90 cm2/V s at x=0.5. The main parameter in the alloy scattering formulation, the alloy potential Eal, is found to be about 0.5 eV for p-type AlxGa1−xAs.
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Scattering rates for holes near the valence-band edge in semiconductors
T. Brudevoll, Tor A. Fjeldly, J. H. Baek et al. · Journal of Applied Physics · 1990 · 86 citations
Alloy scattering potential in <i>p</i>-type Ga1−<i>x</i>Al<i>x</i>As
Kazuya Masu, Eisuke Tokumitsu, Makoto Konagai et al. · Journal of Applied Physics · 1983 · 30 citations