Composition dependence of photoinduced and thermally induced bleachings of amorphous Ge-S and Ge-S-Ag films

Takeshi Kawaguchi, Shigeo Maruno, Keiji Tanaka

Journal of Applied Physics · 1993 · 50 citations · 20 references

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Abstract

Photoinduced and thermally induced bleachings of as-deposited GexS100−x and (Ge0.3S0.7)100−yAgy films were systematically studied in the ranges of 21≤x≤42 and 0≤y≤67 using optical transmission measurement. The bleachings for the Ge-S system show a maximum at around the stoichiometric composition GeS2, whereas that for the Ge-S-Ag system become smaller with an increase of the Ag content and vanish above 40 at. %. The composition dependence for the Ge-S system can reasonably be explained by an increase in the Ge-S bond density and subsequent decrease of short- and medium-range disordering. The bleaching rates, which are relatively small for Ge-rich films, are considered to be associated with the flexibility of the local network structure. The photo-oxidation phenomenon, which is observed for the films illuminated in air, also shows a maximum at around GeS2. The composition dependence for the bleaching of Ag-containing Ge30S70 films can be understood in a similar way to the Ge-S system. The vanishing at y≂40 is associated with a thermodynamically stable phase at that composition for the Ge-S-Ag system.

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