Applied Physics Letters · 2001 · 12 citations · 9 references
EngineeringMaterials EngineeringMaterials ScienceElectronic MaterialsSemiconductor DevicesSemiconductor MaterialsEtching ProcessesPorous MaterialsCrystal Plane OrientationElectroluminescenceEtchingField EmissionPore MorphologyPorous CrystalsSurface Etching
Morphology of n-type porous GaP samples with (100) crystal orientation was modified by postchemical etching for field-emitter application. The structures produced have uniform size and shape distribution and are found to show good emission characteristics. The mechanism of the morphology modification is explained, and a strong correlation between field-emission characteristics and postchemical etching time is shown.
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Vacuum microelectronic devices
I. Brodie, P. R. Schwoebel · Proceedings of the IEEE · 1994 · 274 citations