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A GPU-based full-chip inverse lithography solution for random patterns
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2010
Year
EngineeringIndustrial EngineeringInverse Lithography ToolPattern TransferAdvanced ManufacturingComputer-aided DesignInverse Lithography SolutionComputational FabricationBeam LithographyComputer-aided EngineeringSystems EngineeringRandom PatternsProcess OptimizationNanolithography MethodComputer EngineeringInverse ProblemsMicroelectronics3D PrintingMicrofabricationManufacturing Process
An inverse lithography solution based on optimization is presented. The optimization approach, in effect, operates as an inverse lithography tool, based on modeling and simulation of the manufacturing process. Given the associated computational requirements, the proposed solution intentionally uses graphic processors (GPUs) as well as CPUs as computation hardware. Due to the approach we employed, the results are optimized towards manufacturability and process window maximization.