Deoxidization of Iridium Oxide Thin Film

Abstract

Deoxidization phenomenon of iridium oxide (IrO 2 ) film, which has been used as a diffusion barrier for ferroelectric capacitors, is investigated changing the temperature and oxygen pressure during the post process. The deoxidization is well understood by explaining the relationship between the temperature and dissociation pressure according to the thermodynamics. A simple thermodynamic calculation for the deoxidization of IrO 2 gives a guideline for successive process condition at which the stability of IrO 2 films can be maintained.